Transferring the Record p-type Si POLO-IBC Cell Technology Towards an Industrial Level

authored by
Felix Haase, Christina Hollemann, Soren Schafer, Jan Krügener, Rolf Brendel, Robby Peibst
Abstract

We report on the transfer of our lab-type POLO2-IBC process with POLO contacts for both polarities towards an industrial level. Here we demonstrate a shortened cell fabrication process that uses p-type wafers and keeps the Al-back surface field of the PERC process but substitutes the phosphorous diffusion by a n-type poly-Si deposition. The resulting POLO-IBC process is similarly short as the PERC process. A high lifetime with the Cz material and highly selective POLO junctions require a reduce thermal budget and a reduced thickness of the interfacial oxide compared to our previous lab cells that used FZ silicon wafers. Our POLO-IBC cells have an efficiency potential of 24.5 % as deduced from simulations. We measure an efficiency of 21.8 % after finishing the first cell batch. For a cell from our second cell batch with improved passivation we measure an implied pseudo efficiency of 25.2 % before laser contact openings.

Organisation(s)
Institute of Electronic Materials and Devices
Laboratory of Nano and Quantum Engineering
Institute of Solid State Physics
External Organisation(s)
Institute for Solar Energy Research (ISFH)
Type
Conference contribution
Pages
2200-2206
No. of pages
7
Publication date
06.2019
Publication status
Published
Peer reviewed
Yes
ASJC Scopus subject areas
Control and Systems Engineering, Industrial and Manufacturing Engineering, Electrical and Electronic Engineering
Sustainable Development Goals
SDG 7 - Affordable and Clean Energy
Electronic version(s)
https://doi.org/10.1109/pvsc40753.2019.8980960 (Access: Closed)